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dc.contributor.authorBoyd, Ian Williamen
dc.date.accessioned2008-10-22T14:37:26Z
dc.date.available2008-10-22T14:37:26Z
dc.date.issued1982en
dc.identifier.otherD44041/82en
dc.identifier.urihttp://hdl.handle.net/10399/1764
dc.format.mediumNot currently available online. A paper copy may be available – please contact the Library for help.en
dc.language.isoen
dc.publisherHeriot-Watt Universityen
dc.publisherPhysicsen
dc.rightsAll items in ROS are protected by the Creative Commons copyright license (http://creativecommons.org/licenses/by-nc-nd/2.5/scotland/), with all rights reserved.en
dc.titleLaser processing of Si and the growth and structure of Si oxidesen
dc.typethesisen


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